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2001.07.01~2003.06.30 |
(2³â) Plasma Processing chamberÃÖÀûȺм® tool±â¼ú°³¹ß |
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2002.10.01~2003.03.31 |
(6°³¿ù) Plasma chamber ImpedanceÃøÁ¤ÀåÄ¡ÀÇ »óÇ°È |
Çѱ¹»ê¾÷±â¼úÀç´Ü |
2003.03.01~2004.02.29 |
(1³â) Plasma ÀåºñÀÇ RF ¼±µµ±â¼ú°³¹ß |
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2003.11.01~2005.10.31 |
(2³â) ºñÆÄÁö °Ë»ç¿ë X¼± ¿µ»ó½Ã½ºÅÛ¿ë ¼¾¼ ¾î·¹ÀÌ Á¦ÀÛ ±â¼ú |
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2004.09.01~2007.08.31 |
(3³â) ¹ÝµµÃ¼/µð½ºÇ÷¹ÀÌ Á¦Á¶Àåºñ¿ë RF Plasma ¸ðµâ °³¹ß |
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